BASE WITH ULTRA-PHOBIC SURFACE POSSESSING LOW LIGHT DIFFUSION

摘要

FIELD: production of self-cleaning ultra-phobic surfaces. ^ SUBSTANCE: proposed base is characterized by total losses of light for diffusion within <=7%, preferably <=3% and more preferably <=1% at contact wetting angle of >=140°, preferably >=150°. ^ EFFECT: avoidance of impairment of transparence because of turbidity. ^ 33 cl, 2 tbl, 1 ex