发明名称 RADIATION-CURABLE LIQUID RESIN COMPOSITION
摘要 The invention relates to a radiation - curable liquid resin composition comprising: (A) 20-90 wt% of a urethane (meth)acrylate oligomer, and (B) 1-35 wt% of - a monomer shown by the following formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 and R3 individually represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R4represents a hydrogen atom or a methyl group, and n represents an integer of 1-6, or - a monomer including a hydroxyl group.
申请公布号 KR20060093697(A) 申请公布日期 2006.08.25
申请号 KR20067003322 申请日期 2006.02.17
申请人 DSM IP ASSETS B.V.;JSR CORPORATION 发明人 TAKAHASHI ATSUYA;SHIGEMOTO TAKEO;KOMIYA ZEN;OHARA HIROKI
分类号 C08L33/10;C03C25/10;C08F290/06;C08G18/67;C08G18/81;C08L33/08;C08L75/00;C09D175/16 主分类号 C08L33/10
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