| 摘要 |
An inexpensive substrate washing apparatus (1) capable of developing the same degree of washing force also on the side faces of a substrate as that on the principal plane thereof and capable of changing the angle of an injector during washing without so changing an injection distance, comprising a table (10) horizontally supporting the substrate (70) so as to be rotated, the injector (30) injecting washing fluid to the substrate, an arm (16) holding the injector at a first end part, and a pivot shaft (12) holding the second end part of the arm so as to be rotated around a horizontal axis and guiding in a direction parallel with a table, characterized in that the arm (16) is formed so that the first end part as viewed from the axial direction of the second end part is positioned apart from the axis thereof.
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