发明名称 SILICA GLASS PLATE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a high-quality silica glass plate excellent in the transmittance for an excimer lamp light and light resistance and capable of being manufactured with a high yield at a low cost and its manufacturing method. SOLUTION: The manufacturing method comprises a process in which a slit is formed in the axial direction of a tubular synthetic silica glass body containing SiOH group of≥1 ppm, and the silica glass body is placed on a heat-resistant plate inside a furnace in such a manner that the slit comes to the upper surface and heated to be deformed into a platy silica glass body, a process in which the platy silica glass body is heat-treated at 600-1,200°C, and a process in which a contaminated part of the periphery of the platy silica glass body is removed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006219349(A) 申请公布日期 2006.08.24
申请号 JP20050034995 申请日期 2005.02.10
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 NISHIMURA HIROYUKI;YOSHIDA YOSHIMASA;OSHIMA TAKAYUKI
分类号 C03B20/00;C03C3/06 主分类号 C03B20/00
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