| 发明名称 |
Optical proximity correction performed with respect to limited area |
| 摘要 |
A method of performing optical proximity effect correction includes defining a partial area of an entire area of a mask pattern, the mask pattern including a real pattern and a dummy pattern, and performing optical proximity effect correction only with respect to the partial area. |
| 申请公布号 |
US2006190920(A1) |
申请公布日期 |
2006.08.24 |
| 申请号 |
US20060357118 |
申请日期 |
2006.02.21 |
| 申请人 |
FUJITSU LIMITED |
发明人 |
SAKURAI MITSUO;MINEMURA MASAHIKO |
| 分类号 |
G06F17/50;G03F1/08;G03F1/14;G03F1/36;G03F1/68;H01L21/027;H01L21/82 |
主分类号 |
G06F17/50 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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