发明名称 Microlens structure for image sensors
摘要 A microlens structure and a method of fabrication thereof are provided. The method comprises forming a layer of microlens material over a substrate, which has photo-sensitive elements formed therein. The microlens material, which comprises a photo-resist material, is exposed in accordance with a desired pattern a plurality of times. The energy used with each exposure process is less than the energy required if a single exposure is used. Furthermore, the masks used for each exposure may differ. In an embodiment, the masks are varied so as to create a notch in the upper corner of the microlens.
申请公布号 US2006189024(A1) 申请公布日期 2006.08.24
申请号 US20050181508 申请日期 2005.07.14
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 KAO MING-CHANG;CHANG CHIH-KUNG;WENG FU-TIEN;CHANG BII-JUNQ
分类号 H01L21/00 主分类号 H01L21/00
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