发明名称 COAT-FILM FORMING APPARATUS, COAT-FILM FORMING METHOD AND COMPUTER PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a cheap coat-film forming apparatus which facilitates the installation and arrangement of a sensor to a coating nozzle and collision of the coating nozzle and a substrate can be prevented. <P>SOLUTION: A resist-film forming apparatus 10 comprises a loading table 11 of the substrate G, a resist nozzle 12, a horizontal driving mechanism 14 and a elevation mechanism 15 for moving the nozzle 12, a sensor array 20 equipped with an optical sensor 21 for detecting a change of a nozzle gap, a sub-controlling part 60 wherein an output signal is alloted to a standard output signal each of the sensor 21 at the time when the nozzle 12 is arranged at a discharge starting position of a resist liquid and the change of the gap is observed from a difference of the standard output signal and a signal from each sensor 21 when the resist liquid is discharged on the substrate G to form a resist film, and a main controlling part 50 wherein operation of the nozzle 12 is controlled so that a signal about the change of the gap from the sub-controlling part 60 is took in to prevent contact of the nozzle 12 and the substrate G. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006218408(A) 申请公布日期 2006.08.24
申请号 JP20050034634 申请日期 2005.02.10
申请人 TOKYO ELECTRON LTD 发明人 OTSUKA KEISUU;NAKAMITSU TAKASHI;MIYAZAKI KAZUHITO;KAWAGUCHI YOSHIHIRO
分类号 B05C5/02;B05D3/00;G01B11/14;G03F7/16;H01L21/027 主分类号 B05C5/02
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