发明名称 LIQUID DEVELOPER AND METHOD FOR MANUFACTURING LIQUID DEVELOPER
摘要 PROBLEM TO BE SOLVED: To provide a liquid developer excellent in offset resistance and a method for efficiently manufacturing such a liquid developer. SOLUTION: The liquid developer contains toner particles dispersed in an insulating liquid, wherein the toner particles each have voids which communicate with the outer surface within the particle, the voids each have a portion whose diameter is larger than an open diameter in the vicinity of the outer surface of the toner particle within the void, and the toner particles hold the insulating liquid in the voids. When the open diameter of the void in the vicinity of the outer surface of the toner particle is represented by X [nm] and the maximum diameter within the void by Y [nm], a relationship of 0.01≤X/Y≤10 is satisfied. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006220842(A) 申请公布日期 2006.08.24
申请号 JP20050033270 申请日期 2005.02.09
申请人 SEIKO EPSON CORP 发明人 MIURA SATORU;KAIHO HIROSHI
分类号 G03G9/12;G03G9/13 主分类号 G03G9/12
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