| 摘要 |
PROBLEM TO BE SOLVED: To efficiently perform the cooling of each target, and further, to obviate a load lock chamber or the like for the exchange of each workpiece, thus to attain the miniaturization of a film deposition system. SOLUTION: A rotary table 6 provided inside a vacuum chamber 1 is mounted with a plurality of targets T and a cover 5 for pressure separation. Each target T is moved to a sputtering position corresponding to the opening part in the vacuum chamber 1 facing to the film deposition face of each workpiece W one by one, a sputter driving source 8 having a cooling water flow passage is pressed against the rear side thereof, the deposition of a multilayer film is performed, and, at the time of exchanging each workpiece W, the opening part of the vacuum chamber 1 is closed. The sputter driving source 8 is moved in the direction of the arrow R by a sputter driving source moving means arranged at the atmospheric side, and is pressed against a target supporting board 3. COPYRIGHT: (C)2006,JPO&NCIPI
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