Photoresist topcoat for a photolithographic process

摘要

A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas T_m^R3 where m is equal to 8, 10 or 12 and Q_nM_n^R1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.