发明名称 Semiconductor-on-diamond devices and methods of forming
摘要 The present invention provides semiconductor-on-diamond devices, and methods for the formation thereof. In one aspect, a mold is provided which has an interface surface configured to inversely match a configuration intended for the device surface of a diamond layer. An adynamic diamond layer is then deposited upon the diamond interface surface of the mold, and a substrate is joined to the growth surface of the adynamic diamond layer. At least a portion of the mold can then be removed to expose the device surface of the diamond which has received a shape which inversely corresponds to the configuration of the mold's diamond interface surface. The mold can be formed of a suitable semiconductor material which is thinned to produce a final device. Optionally, a semiconductor material can be coupled to the diamond layer subsequent to removal of the mold.
申请公布号 US2006186556(A1) 申请公布日期 2006.08.24
申请号 US20050323187 申请日期 2005.12.29
申请人 发明人 SUNG CHIEN-MIN
分类号 H01L23/58;H01L21/04;H01L21/20;H01L21/205;H01L21/314;H01L23/373;H01L29/16;H01L31/0312 主分类号 H01L23/58
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