发明名称 |
SUBSTRATE, MINUTE STRUCTURE, REFERENCE SCALE MANUFACTURING METHOD, AND MINUTE STRUCTURE LENGTH MEASURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To precisely and easily perform length measurement irrespective of the posture of a length measuring object. SOLUTION: This substrate 2 is equipped with a substrate body 5 with a measuring object 3 formed on its surface 5a, and a reference scale 6 provided on the surface 5a of the substrate body 5 so as to extend at least in one direction in the vicinity of an area with the measuring object 3 formed therein. The reference scale 6 has a plurality of graduations 7 formed by utilizing a focused ion beam (FIB) and disposed next to each other at predetermined intervals. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006220560(A) |
申请公布日期 |
2006.08.24 |
申请号 |
JP20050034730 |
申请日期 |
2005.02.10 |
申请人 |
SII NANOTECHNOLOGY INC |
发明人 |
MUNEKANE MASANAO;TASHIRO JUNICHI |
分类号 |
G01B9/04;H01L21/66 |
主分类号 |
G01B9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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