发明名称 SUBSTRATE, MINUTE STRUCTURE, REFERENCE SCALE MANUFACTURING METHOD, AND MINUTE STRUCTURE LENGTH MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To precisely and easily perform length measurement irrespective of the posture of a length measuring object. SOLUTION: This substrate 2 is equipped with a substrate body 5 with a measuring object 3 formed on its surface 5a, and a reference scale 6 provided on the surface 5a of the substrate body 5 so as to extend at least in one direction in the vicinity of an area with the measuring object 3 formed therein. The reference scale 6 has a plurality of graduations 7 formed by utilizing a focused ion beam (FIB) and disposed next to each other at predetermined intervals. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006220560(A) 申请公布日期 2006.08.24
申请号 JP20050034730 申请日期 2005.02.10
申请人 SII NANOTECHNOLOGY INC 发明人 MUNEKANE MASANAO;TASHIRO JUNICHI
分类号 G01B9/04;H01L21/66 主分类号 G01B9/04
代理机构 代理人
主权项
地址