| 摘要 |
<P>PROBLEM TO BE SOLVED: To enhance the sensitivity of a resist film composed of an active energy ray curable resin composition when the resist film is exposed according to a predetermined pattern by being irradiated with an active energy ray. <P>SOLUTION: When the resist film composed of the active energy ray curable resin composition is exposed according to a predetermined pattern by being irradiated with an active energy ray, the temperature of the resist film is set to be ≥40°C. The sensitivity of the resist film to the active energy ray can be drastically enhanced and the productivity can be improved even a low exposing amount by raising the temperature of the resist film when the film is exposed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
