| 摘要 |
<P>PROBLEM TO BE SOLVED: To perform highly accurate image exposure by uniformizing a light quantity in each of two-dimensionally distributed drawing units while suppressing the cost of a device. <P>SOLUTION: The light quantity distribution of a light beam emitted from an exposure head on an exposure surface is measured, and the light quantity is controlled to uniformize the light quantity distribution on the exposure surface by the light beam emitted from the exposure head on the basis of the measurement information obtained by the light quantity measurement. The light quantity is corrected to be uniform in each drawing unit in a plurality of two-dimensionally distributed pixel parts, and highly accurate image exposure can be carried out. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
