Compound film with a nonlinear third order susceptibility, and method for fabricating the same

摘要

A carbon hydrogen raw material gas and a SF₆ raw material gas are introduced into a chamber with Ar carrier gas, and a high frequency electric power is introduced into the chamber to discharge the raw material gas to be made plasma. At the same time, a metallic plate on a main surface of one of parallel plate electrodes is sputtered to form a compound film made of carbon, sulfide and Au elements which are dispersed in the film matrix made of carbon and sulfide and does not constitute clusters through aggregation.