HYDROGEN ATOM GENERATION SOURCE IN VACUUM TREATMENT APPARATUS, AND HYDROGEN ATOM TRANSPORTATION METHOD

摘要

This invention provides a hydrogen atom generation source in a vacuum treatment apparatus, which can effectively inhibit such an unfavorable phenomenon that, upon contact of a hydrogen atom with the internal wall surface in a treatment chamber in a vacuum treatment apparatus or with the internal wall surface in a transport passage, the hydrogen atom is recombined and returned to a hydrogen molecule, and a hydrogen atom transportation method. The hydrogen atom generation source in a vacuum treatment apparatus is such that at least a part of a surface, which faces a space of a member surrounding a hydrogen atom generation means in its hydrogen atom generation means-disposed part, is covered with SiO<SUB>2</SUB>. The method for transporting a hydrogen atom in a vacuum treatment apparatus is a method for transporting a hydrogen atom produced by a hydrogen atom generation means in the vacuum treatment apparatus to a desired place. In this method, the hydrogen atom is transported through a transportation passage of which the internal wall surface is covered with SiO<SUB>2</SUB>.