| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which has good temperature control precision and throughput. <P>SOLUTION: The exposure device projects the pattern of an original edition on a substrate by a projection optical system. The exposure device includes the projection optical system, a nozzle for supplying liquid to an exposure light passing region between the projection optical system and the substrate, a circulatory system which circulates the liquid supplied to the nozzle, and a first temperature control means for adjusting the temperature of the liquid in the circulatory system. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
