| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measuring method of interference for accurately measuring wavefront aberrations. <P>SOLUTION: The interference measuring method for measuring the wavefront aberrations of an optical member by an interference includes processes of: disposing the optical member between first and second parallel planar members; filling a gap between the optical member and the first parallel planar member and a gap between the optical member and the second parallel planar member with an oil having the approximately same refraction index as the optical member and forming an oil layer; irradiating the first parallel planar member with a measurement beam; a process of partially reflecting the measurement beam on an incident plane of the first parallel planar member and forming a first reflection beam; making the beam enter the second parallel planar member, after the beam passes through the first parallel planar member, the oil layer and the optical member; a process of reflecting the beam on a face opposite to the incident plane of the second parallel planar member and forming a second reflection beam; making the first reflection beam interfere with the second reflection beam and forming an interference beam; and analyzing an interference pattern in the interference beam. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
