发明名称 |
GALLIUM NITRIDE SYSTEM COMPOUND SEMICONDUCTOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a gallium nitride system compound semiconductor which has a large diameter and can utilize a conventional silicon process, and to provide a method for manufacturing the same. <P>SOLUTION: The gallium nitride system compound with excellent properties as a semiconductor material is formed on a comparatively inexpensive Si substrate. The conventional silicon process can be utilized by forming on the Si substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006222402(A) |
申请公布日期 |
2006.08.24 |
申请号 |
JP20050036945 |
申请日期 |
2005.02.14 |
申请人 |
TOSHIBA CERAMICS CO LTD |
发明人 |
SUZUKI SHUNICHI;ABE YOSHIHISA;KOMIYAMA JUN;NAKANISHI HIDEO |
分类号 |
H01L21/205;C30B25/18;C30B29/38;H01L21/20;H01L33/32;H01S5/323 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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