发明名称 GALLIUM NITRIDE SYSTEM COMPOUND SEMICONDUCTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a gallium nitride system compound semiconductor which has a large diameter and can utilize a conventional silicon process, and to provide a method for manufacturing the same. <P>SOLUTION: The gallium nitride system compound with excellent properties as a semiconductor material is formed on a comparatively inexpensive Si substrate. The conventional silicon process can be utilized by forming on the Si substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006222402(A) 申请公布日期 2006.08.24
申请号 JP20050036945 申请日期 2005.02.14
申请人 TOSHIBA CERAMICS CO LTD 发明人 SUZUKI SHUNICHI;ABE YOSHIHISA;KOMIYAMA JUN;NAKANISHI HIDEO
分类号 H01L21/205;C30B25/18;C30B29/38;H01L21/20;H01L33/32;H01S5/323 主分类号 H01L21/205
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