| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holder which is suitably for dry etching, prevents a boundary region between the peripheral edge portion of the substrate holder and a resist, and prevents contamination of the substrate holder due to the resist, and to provide a dry etching apparatus equipped with the substrate holder. SOLUTION: The substrate holder 1 is provided with a substrate holding unit 10 for pressing the peripheral portion 100a of the substrate 100 to hold the substrate 100; and an eaves portion 12 formed so as to cover the boundary region between the peripheral portion 100a (range shown by B in the figure) of the substrate 100 and the resist 110 when the substrate holding unit 10 presses the substrate 100, and provided on a position not contacting the resist 110. The dry etching apparatus is provided with the substrate holder 1. COPYRIGHT: (C)2006,JPO&NCIPI |
