发明名称 CONTINUOUS EMISSION EXCIMER LASER OSCILLATION EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide series luminescence excimer laser oscillation equipment that imposes little load on the lens material or its surface, in which a mirror and lens scanning control system can be simplified. SOLUTION: In excimer laser oscillation equipment, an inart gas such as Kr, Ar, Ne, etc. and a F<SB>2</SB>gas are mixed, and has a laser chamber for storing a laser gas, and an optical resonator made of a pair of reflectors. The inner surface of the laser chamber for storing the laser gas is composed of fluoride and is made into a non-reflecting surface for light with a desirable wavelength of 248 nm, 193 nm, etc. , and a microwave-introducing means is provided for continuously exciting the laser gas, and has a reflection factor of 90% or higher for light with the wavelength on the output side reflector. It is desirable that the laser gas be supplied continuously; furthermore, the concentration of the F<SB>2</SB>be 1 to 6%, and the pressure be several tens of Torrs to 1 atm. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006222448(A) 申请公布日期 2006.08.24
申请号 JP20060107848 申请日期 2006.04.10
申请人 OMI TADAHIRO;CANON INC 发明人 OMI TADAHIRO;TANAKA NOBUYOSHI;HIRAYAMA MASAKI
分类号 H01S3/0973;H01S3/225 主分类号 H01S3/0973
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