发明名称
摘要 <P>PROBLEM TO BE SOLVED: To obtain a positive photosensitive insulating resin composition having excellent resolution, electric insulating property and thermal shock resistance and giving a cured product with preferable adhesion property and solvent resistance. <P>SOLUTION: The positive photosensitive insulating resin composition is characterized in that it is provided with an alkali soluble resin (A) having a phenolic hydroxyl group, a compound (B) having a quinone diazide group, crosslinked fine particles (C), a compound (D) having at least two alkyletherified amino groups in the molecule, thermosensitive acid generator (E) and a solvent (F). The cured product characterized in that it is obtained by curing the above positive photosensitive insulating resin composition. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP3812655(B2) 申请公布日期 2006.08.23
申请号 JP20020018390 申请日期 2002.01.28
申请人 发明人
分类号 G03F7/004;G03F7/022;G03F7/032;H01L21/312 主分类号 G03F7/004
代理机构 代理人
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