Lithographic projection apparatus,申请号EP20000304667-传众专利搜索

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发明名称	Lithographic projection apparatus
摘要
申请公布号	EP1059566(B1)	申请公布日期	2006.08.23
申请号	EP20000304667	申请日期	2000.06.01
申请人	ASML NETHERLANDS B.V.	发明人	VAN EMPEL, TJARKO ADRIAAN RUDOLF;JANSEN, HANS
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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