发明名称 Method of fabrication of a microstructure in titanium.
摘要 The method involves depositing a gold layer on a substrate (10) with a superficial titanium layer. A resin mask (16), with a shape corresponding to the shape of a desired microstructure (20), is formed on the gold layer. Openings of the masks are filled by a gold mask (18). The mask (16) and portions of the gold layer are eliminated. The uncovered titanium surface across the gold mask is processed, to fabricate the microstructure.
申请公布号 EP1693338(A1) 申请公布日期 2006.08.23
申请号 EP20050405198 申请日期 2005.02.17
申请人 CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE S.A. - RECHERCHE ET DEVELOPPEMENT 发明人 CARDOT, FRANCIS
分类号 B81C1/00;G03F7/11 主分类号 B81C1/00
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