发明名称 Charge trapping memory cell
摘要 In a charge trapping memory cell, programming occurs by trapping hot electrons from the channel region in a storage layer. The erasure occurs by Fowler-Nordheim tunneling of the electrons through the lower boundary layer to source or drain or preferably through the upper boundary layer into the gate electrode. The boundary layers are preferably aluminum oxide.
申请公布号 US7095078(B2) 申请公布日期 2006.08.22
申请号 US20040954156 申请日期 2004.09.29
申请人 INFINEON TECHNOLOGIES AG 发明人 VERHOEVEN MARTIN
分类号 H01L29/792;G11C7/00;G11C16/00;G11C16/04;H01L21/8246;H01L27/115 主分类号 H01L29/792
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