发明名称 |
Developer solution and process for use |
摘要 |
An improved composition and method for the development of resists is disclosed. The method comprises contacting the resist with a developer solution comprising a source of alkalinity and a cationic surfactant which is an ethoxylated and/or propoxylated tallow amine. The improved developer solution more effectively removes the uncured resist from the resist coated surface.
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申请公布号 |
US7094523(B1) |
申请公布日期 |
2006.08.22 |
申请号 |
US20050290118 |
申请日期 |
2005.11.30 |
申请人 |
FENG KESHENG;HART DANIEL J |
发明人 |
FENG KESHENG;HART DANIEL J. |
分类号 |
G03F7/30;G03F7/32 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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