semiconductor device having a vertical gate and fabrication method thereof,申请号KR20040110627-传众专利搜索

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发明名称	semiconductor device having a vertical gate and fabrication method thereof
摘要
申请公布号	KR100613287(B1)	申请公布日期	2006.08.21
申请号	KR20040110627	申请日期	2004.12.22
申请人		发明人
分类号	H01L29/78	主分类号	H01L29/78
代理机构		代理人
主权项
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