PHOTOMASK, METHOD OF GENERATING MASK PATTERN, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

A photomask includes a pair of light-transmission opening patterns extending in parallel and each having a substantially identical line width with a center light-shielding linear portion extending linearly therebetween, and semi-transmissive regions arranged to sandwich the pair of light-transmission opening patterns from opposing sides in a direction of width. The semi-transmissive region serves as an in-phase semi-transmissive portion with such a characteristic that transmitted light is in phase with light transmitted through the light-transmission opening pattern. In addition, the semi-transmissive region includes patterns arranged at such a small pitch as not resolved by illumination of light.