发明名称 |
SEMICONDUCTOR WAFER PROCESSING SYSTEM EQUIPPED WITH VERTICALLY-STACKED PROCESSING CHAMBER AND SINGLE-SHAFT DOUBLE-WAFER CARRIER SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor wafer processing system configured in a way that one unprocessed wafer and one processed wafer can be carried together. SOLUTION: This semiconductor wafer processing system consists of a multi-chamber module equipped with vertically stacked semiconductor wafer processing chambers and a dedicated load lock chamber for each semiconductor wafer processing chamber. Each processing chamber contains a chuck for holding a wafer during wafer processing. The multi-chamber module may be oriented in a linear array. This system also contains equipment with a single-axis double-wafer transportation arm including a monolithic arm attached in a way that it can turn around the single pivot axis within the above load lock chamber. This equipment is configured in a way that two wafers, one unprocessed wafer and one processed wafer, can be carried together between the load lock chamber and processing chamber. A method for using the disclosed system is also provided. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006216983(A) |
申请公布日期 |
2006.08.17 |
申请号 |
JP20060109009 |
申请日期 |
2006.04.11 |
申请人 |
ASML US INC |
发明人 |
SAVAGE RICHARD N;MENAGH FRANK S;CARVALHEIRA HELDER R;TROIANI PHILIP A;COSSENTINE DAN L;VAUGHAN ERIC R;MAYER BRUCE E |
分类号 |
G03F7/20;H01L21/677;B65G49/07;C23C16/54;H01L21/00;H01L21/02;H01L21/205;H01L21/31;H01L21/687 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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