| 摘要 |
An antireflection film comprising a transparent substrate film having thereon a hard coat, a high refractive index layer and a low refractive index layer, wherein: (i) the high refractive index layer is formed by applying a coating solution containing the following (a) to (c); (ii) the low refractive index layer is formed by applying a coating solution containing the following (d) and (e); (iii) the antireflection film is heat treated, wherein (a) metal oxide particles having an average primary particle diameter of 10 to 200 nm; (b) a metal compound; (c) an ionizing radiation curable resin; (d) an organosilicon compound having a prescribed structure, a hydrolyzed compound of the organosilicon compound, a decomposed compound of the organosilicon compound or a polycondensed compound of the organosilicon compound; and (e) hollow silica particles each having an outer shell, and a void or a porous portion in the inside.
|
