发明名称 |
Method for forming generating mask data |
摘要 |
A mask pattern to be provided on a transparent substrate 2 includes a semi-light-shielding portion 3 which transmits exposure light in the same phase as that of the light-transmitting portion 4 and a phase shifter 5 which transmits exposure light in a phase opposite to that of the light-transmitting portion 4. The semi-light-shielding portion 3 has a transmittance which allows exposure light to be partially transmitted. The phase shifter 5 is provided in a region of the mask pattern in which light transmitted through the phase shifter 5 can cancel part of the light transmitted through the light-transmitting portion 4 and the semi-light-transmitting portion 3. |
申请公布号 |
US2006183032(A1) |
申请公布日期 |
2006.08.17 |
申请号 |
US20060401857 |
申请日期 |
2006.04.12 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
MISAKA AKIO |
分类号 |
G03C5/00;G03F1/00;G03F1/14;G03F1/29;G03F1/32;G03F1/36;G03F1/68 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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