发明名称 |
Method for making thin film devices intended for solar cells or silicon-on-insulator (SOI) applications |
摘要 |
In one inventive aspect, a thin film device is manufactured by (a) forming a porous semiconductor layer in the form of a thin film on an original substrate, the formation being immediately followed by (b) separation of the thin film by a lift-off process from the original substrate; (c) transfer of the thin film to a dummy support, the thin film not being attached to the dummy support; (d) fabrication of a device on top of the thin film; and (e) transfer and attachment of said device on said thin film on a foreign substrate.
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申请公布号 |
US2006184266(A1) |
申请公布日期 |
2006.08.17 |
申请号 |
US20060392372 |
申请日期 |
2006.03.29 |
申请人 |
SOLANKI CHETAN S;BILYALOV RENAT;POORTMANS JEF |
发明人 |
SOLANKI CHETAN S.;BILYALOV RENAT;POORTMANS JEF |
分类号 |
G06F19/00;H01L21/762;H01L31/18 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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