| 摘要 |
A substrate inspection system includes a plurality of load-lock-less inspection chambers, which are share a single pump unit. A plurality of valves are configured to selectively couple the pump unit to a selected one of the plurality of inspection chambers. The pump unit is configured to pump air out of the selected one of the plurality of inspection chambers while a substrate or substrates in one or more of the remaining plurality of load-lock-less inspection chambers is being inspected. Each load-lock-less inspection chamber may have an associated plurality of rows of electron guns. The plurality of rows of electron guns are operable to provide an electron source for performing voltage waveform contrasting. By employing load-lock-less inspection chambers, a single, shared pump unit, and/or the plurality of rows of electron guns, the footprint of the substrate inspection system can be minimized.
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