Exposure control means

摘要

1,020,410. Photo-electric exposure control systems. EASTMAN KODAK CO. Aug. 4, 1964 [July 23, 1963], No. 30718/64. Heading G2A. On depressing shutter release member 21, lever 10 is moved about its pivot 11 by spring 13, as permitted by the co-acting part of member 21. Electromagnet 27 is responsive to photo-resistor cell 25 so that, at a critical level of illumination of the cell, it releases armature 28 and hook 29 adopts an intercepting position for porjections 46 and 18. When the ambient illumination is below this critical level, the hook 29 intercepts the first projection 46 (as this moves upwardly) and thereby moves pivoted low light signal 41 into the field of view-finder 42 (Fig. 2, not shown). When the ambient illumination is slightly above the critical value, the armature 28 is held upright until mask 16 moves up over cell 25 and reduces its illumination below the critical value. Armature 28 is thus released after the passage of projection 46 and accordingly traps projection 18, as shown, so that lens aperture 20 is not changed. In bright light conditions, the momentary attenuation, as mask 16 crosses cell 25 does not go below the critical value and armature 28 remains upright throughout the movement of lever 10. The movement goes beyond the position shown to align reduced aperture 15 with the lens aperture 20 (Fig. 4, not shown). Sliding contact 24 is also moved about pivot 11 by release 21 and, during its movement over fixed contacts 32, 33 and 34, it momentarily joins all three, to connect a battery directly across the electro-magnet 27. Thereafter, it joins contacts 33 and 34 to connect the cell 25 in series with the magnet 27.