| 摘要 |
PROBLEM TO BE SOLVED: To provide a washer capable of preventing a re-adhesion on a wafer of a foreign matter, and to provide the washer having a high washing efficiency. SOLUTION: A plurality of the wafers 2 are dipped in a washing liquid 6 in a washing tank 1 and washed. Shielding plates 3 are mounted among the wafers 2 in the washing tank 1. A plurality of jets are formed to both surfaces of the shielding plates 3, and the washing liquid 6 may also be injected towards the upper sections of the wafers 2 from the jets. A plurality of suction ports are formed to both surfaces of the shielding plates 3, and the washing liquid 6 may also be sucked towards the suction ports from the lower sections of the wafers 2. It is preferable that the washer has a circulating means for supplying the washing tank 1 with the sucked washing liquid 6 again in this case. COPYRIGHT: (C)2006,JPO&NCIPI
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