发明名称 ELECTROSTATIC DEFLECTION SYSTEM FOR CORPUSCULAR RADIATION
摘要 PROBLEM TO BE SOLVED: To provide an electrostatic deflection system for corpuscular radiation, in which individual electrodes permanently have and retain a very exact axially symmetric arrangement relative to one another. SOLUTION: The present invention relates to an electrostatic deflection system for corpuscular radiation which can be used particularly for microstructured and nanostructured applications in a lithography device or a measuring device. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006216558(A) 申请公布日期 2006.08.17
申请号 JP20060027127 申请日期 2006.02.03
申请人 LEICA MICROSYSTEMS LITHOGRAPHY GMBH 发明人 RISSE STEFAN;PESCHEL THOMAS;DAMM CHRISTOPH;GEBHARDT ANDREAS;ROHDE MATHIAS;SCHENK CHRISTOPH;ELSTER THOMAS;DOERING HANS-JOACHIM;SCHUBERT GERHARD
分类号 H01J37/147;G03F7/20;H01L21/027 主分类号 H01J37/147
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