发明名称 Etching metal silicides and germanides
摘要 A metal silicide may be selectively etched by converting the metal silicide to a metal silicate. This may be done using oxidation. The metal silicate may then be removed, for example, by wet etching. A non-destructive low pH wet etchant may be utilized, in some embodiments, with high selectivity by dissolution.
申请公布号 US2006180874(A1) 申请公布日期 2006.08.17
申请号 US20060403015 申请日期 2006.04.12
申请人 BRASK JUSTIN K;TURKOT ROBERT B JR 发明人 BRASK JUSTIN K.;TURKOT ROBERT B.JR.
分类号 H01L29/76;H01L21/3213;H01L21/336;H01L29/78 主分类号 H01L29/76
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