发明名称 |
Etching metal silicides and germanides |
摘要 |
A metal silicide may be selectively etched by converting the metal silicide to a metal silicate. This may be done using oxidation. The metal silicate may then be removed, for example, by wet etching. A non-destructive low pH wet etchant may be utilized, in some embodiments, with high selectivity by dissolution.
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申请公布号 |
US2006180874(A1) |
申请公布日期 |
2006.08.17 |
申请号 |
US20060403015 |
申请日期 |
2006.04.12 |
申请人 |
BRASK JUSTIN K;TURKOT ROBERT B JR |
发明人 |
BRASK JUSTIN K.;TURKOT ROBERT B.JR. |
分类号 |
H01L29/76;H01L21/3213;H01L21/336;H01L29/78 |
主分类号 |
H01L29/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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