| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for reliably and fast identifying and measuring an objective pattern with high accuracy out of drawn patterns without relying manpower. <P>SOLUTION: The method includes: steps S1 to S4 of creating a first pattern by adding process shift information to a pattern represented by design data; steps S5, S6 of enlarging the drawn pattern; a step S7 of pattern matching a first pattern as an object of identification, or an enlarged pattern including the objective first pattern and its surrounding patterns, or the enlarged pattern and its surrounding enlarged pattern; and steps S8 to S10 of outputting a coincident or most coincident enlarged pattern by pattern matching. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
