发明名称 Gate valve apparatus of vacuum processing system
摘要 A gate valve apparatus of a vacuum processing system includes a surrounding wall that defines a transfer space and has a transfer port. A first valve seat is defined around the transfer port. A valve body is movable within the surrounding wall to open/close the transfer port. A first seal member is disposed on the valve body to engage with the first valve seat. A maintenance port is formed in the surrounding wall to perform maintenance of the first seal member. A second valve seat is defined around the maintenance port. A second seal member is disposed around the first seal member on the valve body to engage with the second valve seat. A maintenance cover is detachably attached outside to close the maintenance port. A driving mechanism drives the valve body within the surrounding wall.
申请公布号 US2006182534(A1) 申请公布日期 2006.08.17
申请号 US20050304634 申请日期 2005.12.16
申请人 TOKYO ELECTRON LIMITED 发明人 HIROKI TSUTOMU
分类号 H01L21/677 主分类号 H01L21/677
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