| 摘要 |
<P>PROBLEM TO BE SOLVED: To discriminate the direction of defocus, when light exposure and focus amount are measured. <P>SOLUTION: This method for discriminating the direction of defocusing of an exposure device for exposing a resist, includes an imaging step of imaging a resist pattern, formed by exposing by the exposure device to obtain image data, an extraction step of extracting feature data of the image data, and a discrimination step of discriminating the defocus direction, based on the feature data. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
