发明名称 MANUFACTURING METHOD OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a substrate used for manufacturing a master disk for magnetic transfer, by which fluctuation in etching depth of the substrate is not generated and as a result, transfer accuracy is made satisfactory. SOLUTION: The manufacturing method of the substrate of the master disk for magnetic transfer having magnetic layer patterns of a large number of fine uneven shapes formed on the surface thereof is provided with steps for: forming a layer 23 to be worked of a member having an etching selection ratio higher than that of a resist agent 22 on a flat surface of an original plate; applying the resist agent on the surface of the layer to be worked to form a layer of the resist agent; forming aperture parts of the layer of the resist agent on the surface of the layer to be worked by performing drawing exposure to the layer of the resist agent and then performing development treatment; removing the layer to be worked at the aperture parts of the layer of the resist agent by a prescribed depth from the surface; and removing the layer of the resist agent. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006216182(A) 申请公布日期 2006.08.17
申请号 JP20050029570 申请日期 2005.02.04
申请人 FUJI PHOTO FILM CO LTD 发明人 FUJIWARA NOBUHIKO;NISHIMAKI KATSUHIRO
分类号 G11B5/86 主分类号 G11B5/86
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