| 发明名称 |
METHOD AND SYSTEM FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING FLUOROSILICIC ACID |
| 摘要 |
A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fluorosilicic acid.
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| 申请公布号 |
US2006180573(A1) |
申请公布日期 |
2006.08.17 |
| 申请号 |
US20050906353 |
申请日期 |
2005.02.15 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HANSEN BRANDON;LOWE MARIE |
| 分类号 |
B44C1/22;C03C15/00;H01L21/302 |
主分类号 |
B44C1/22 |
| 代理机构 |
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代理人 |
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