发明名称 |
RAW MATERIAL SOLUTION FOR PZT FILM FORMATION BY CHEMICAL VAPOR GROWTH METHOD AND METHOD FOR FORMING PZT FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide an alkyl acetate solution enabling a chemical vapor growth as a Zr compound is left as it is a raw body in a raw material solution used for forming a PZT film by a chemical vapor growth method in a solution vaporization supply, and to provide a method for forming the PZT film using the raw material solution. SOLUTION: An alkyl acetate is used as an organic solvent in the organic solvent solution of (alkoxy)tris(β-diketonato)zirconium. In the organic solvent solution, the PZT film is formed by the chemical vapor growth method by using the raw material solution having the same alkyl group as the alkyl section of the alkoxyl group of (alkoxy)tris(β-diketonato)zirconium. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006216749(A) |
申请公布日期 |
2006.08.17 |
申请号 |
JP20050027405 |
申请日期 |
2005.02.03 |
申请人 |
KOJUNDO CHEM LAB CO LTD |
发明人 |
KADOKURA HIDEKIMI;YAMAGUCHI KAZUSHI;AZUMA SHINTARO;BABA KAZUKI |
分类号 |
H01L21/316;C01G25/00;C23C16/448 |
主分类号 |
H01L21/316 |
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