发明名称 MATERIAL FOR DETECTING TRACK OF PARTICLE BEAM
摘要 PROBLEM TO BE SOLVED: To provide a material for detecting the track of a particle beam capable of highly sensitively detecting charged particles having large energy, securing both satisfactory surface conditions after etching and a sufficiently large ratio of etch pits to background, and having little degradation, so-called aging, in sensitivity due to storage for a long period of time prior to use and very few reductions and contraction, so-called fading, in the number and diameter of etch pits with the passage of time from the incidence of radiation to etching. SOLUTION: In the material for detecting the track of a particle beam, allyl diglycol carbonate is used, and a polyphenol-based oxidation inhibitor, pentaerythrityl-tetrakis[3-(3.5-ditertiarybutyl-4-hydroxyphenyl) propionate] is added to its monomer. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006214970(A) 申请公布日期 2006.08.17
申请号 JP20050030355 申请日期 2005.02.07
申请人 CHIYODA TECHNOL CORP 发明人 OGUCHI HIROYUKI;TAKEBAYASHI SACHIKO;FUJISAKI SABURO;SUDO NORIMICHI;OGUCHI YASUHIRO
分类号 G01T5/10;C08K5/134;C08L31/00 主分类号 G01T5/10
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