| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a contactless potential measurement apparatus with higher sensitivity and higher precision than a conventional one by increasing the range of change in the capacitance between a surface to be measured and a detection electrode. <P>SOLUTION: The potential measurement apparatus comprises a substrate 5 having the detection electrode 3 which is arranged to face the object to be measured, an electric conductive movable shutter 2 which is movably arranged above the detection electrode 3 so that it can be positioned at a first position for at least part of the detection electrode 3 to be exposed to the object to be measured and a second position for at least part of the detection electrode 3 to be covered with respect to the object to be measured, and a fixed shutter 16 which is fixedly arranged at least at part around the detection electrode 3. The fixed shutter 16 is formed so that it has a surface facing the object to be measured between a level of the movable shutter 2 and a level of the detection electrode 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
