| 发明名称 |
System and method for absorbance modulation lithography |
| 摘要 |
A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.
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| 申请公布号 |
US2006183059(A1) |
申请公布日期 |
2006.08.17 |
| 申请号 |
US20060331752 |
申请日期 |
2006.01.13 |
| 申请人 |
MENON RAJESH;SMITH HENRY I |
发明人 |
MENON RAJESH;SMITH HENRY I. |
| 分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
| 代理机构 |
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