发明名称 Image sensor using deep trench isolation
摘要 An image sensor that has a pixel array formed on a semiconductor substrate is disclosed. The pixel array may also be formed on an epitaxial layer formed on the said semiconductor substrate. A plurality of pixels are arranged in a pattern and formed on the epitaxial layer or directly on the semiconductor substrate. Further, a deep trench isolation formed in the semiconductor substrate, and used to separate adjacent pixels of the plurality of pixels. The deep trench isolation extends through substantially the entire epitaxial layer.
申请公布号 EP1691418(A1) 申请公布日期 2006.08.16
申请号 EP20060250392 申请日期 2006.01.25
申请人 OMNIVISION TECHNOLOGIES, INC. 发明人 RHODES, HOWARD E.
分类号 H01L27/146;H01L27/148 主分类号 H01L27/146
代理机构 代理人
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