发明名称 |
Lithographic printing with polarized light |
摘要 |
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.
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申请公布号 |
US7090964(B2) |
申请公布日期 |
2006.08.15 |
申请号 |
US20040781803 |
申请日期 |
2004.02.20 |
申请人 |
ASML HOLDING N.V. |
发明人 |
BABA-ALI NABILA;KREUZER JUSTIN;SEWELL HARRY |
分类号 |
G02B5/30;G03B27/54;G03B27/72;G03C5/00;G03F;G03F7/20;G03F9/00 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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