发明名称 |
Method of making a single-crystal-silicon 3D micromirror |
摘要 |
First and second n-doped regions are formed at a surface of a p-doped single crystal silicon substrate. An aluminum layer is patterned overlying some of the second n-doped regions to form thermal actuators. A dielectric layer is deposited overlying the patterned aluminum layer and an underlying thermal oxide layer. A metal layer is deposited thereover and patterned to form bond pads to the thermal actuators and to form reflecting mirror surfaces overlying others of the second n-doped regions to form micromirrors. The substrate is etched away from the backside stopping at the first and second n-doped regions. Then the wafer is diced into mirror array chips. Portions of the first n-doped regions are etched away from the frontside to form flexible springs wherein the second n-doped regions covered by the patterned aluminum layer form thermal actuators and wherein the flexible springs connect the micromirrors to the thermal actuators.
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申请公布号 |
US7091057(B2) |
申请公布日期 |
2006.08.15 |
申请号 |
US20030742120 |
申请日期 |
2003.12.19 |
申请人 |
AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH |
发明人 |
GAN CHIH KIONG TERENCE;AGARWAL AJAY;SINGH JANAK;ZHANG XIAOLIN |
分类号 |
H01L21/00;G02B26/08;H01L21/302 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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