发明名称 |
PHOTOMASKENANORDNUNG, MIT EINEM PORÖSEN PELLICLE- RAHMEN; UND HERSTELLUNGSMETHODE DESSELBEN. |
摘要 |
A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm2.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/° C. and 10 ppm/° C. |
申请公布号 |
AT333113(T) |
申请公布日期 |
2006.08.15 |
申请号 |
AT20030781312T |
申请日期 |
2003.09.30 |
申请人 |
YAZAKI CORPORATION |
发明人 |
GANGULI, RAHUL;ROBINSON, TROY;MEIXNER, D., LAURENCE |
分类号 |
A47G1/12;B44F1/00;C03B37/016;G03F;G03F1/64;G03F9/00 |
主分类号 |
A47G1/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|